Fuchita Nanotechnology Ltd.

Area

Special Themed Area

Booth Location

S002

Exhibitor Information

We have developed new type of Electrostatic induced Plasma deposition system (EPD) by adopting a tool to optimize electrostatic inductive condition. The tool is a target installed between a nozzle and a substrate. Obtained film provides high density alumina structure with fine texture and excellent electrical insulation property. Besides the deposition rate of the film was 750nm/min (100mm square) which was very high rate comparing with that of normal sputtering method. We have synthesized Zirconia film, Yttria film etc.

Contact Information

URL

http://www.nanotechjp.com

Person in charge

Eiji Fuchita

Email 1

info@nanotechjp.com

PR Contact Information

URL

http://www.nanotechjp.com

Person in charge

Eiji Fuchita

Email 1

info@nanotechjp.com

Links

URL 1

http://www.nanotechjp.com/mwbhpwp/wp-content/uploads/1_2tech.pdf

URL 2

http://www.nanotechjp.com/mwbhpwp/wp-content/uploads/1_3tech.pdf

URL 3

http://www.nanotechjp.com/mwbhpwp/wp-content/uploads/1_4tech.pdf

URL 4

http://www.nanotechjp.com/mwbhpwp/wp-content/uploads/1_6tech.pdf

URL 5

https://www.jstage.jst.go.jp/article/jjspm/64/10/64_558/_pdf/-char/ja